[P-3-21] Effect of Hot-Carrier-Induced Hole Trapping on n-Type LDMOS Transistors
K. S. Tian1、J. F. Chen1、S. Y. Chen1、J. R. Lee1、K. M. Wu2、C. M. Liu2
(1.National Cheng Kung Univ.、2.Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan)
https://doi.org/10.7567/SSDM.2008.P-3-21