[P-3-22] Impact of Tungsten Capping Layer on Yttrium Silicide for Low Resistance Source/Drain Contacts

T. Isogai¹、H. Tanaka¹、T. Goto¹、A. Teramoto¹、S. Sugawa¹、T. Ohmi¹ (1.Tohoku Univ., Japan)

https://doi.org/10.7567/SSDM.2008.P-3-22