[P-3-8] A Vertical-Channel Metal-Oxide-Semiconductor Field-Effect Transistor with Fully-Oxidized Silicon Beam Isolation

A. Sugimura¹, K. Okuyama¹, H. Sunami¹ (1.Hiroshima Univ., Japan)

https://doi.org/10.7567/SSDM.2008.P-3-8