[P-8-7] VO₂ and V₂O₃ Films Fabricated on (1000) or (1010)Al₂O₃ by Reactive RF-Magnetron Sputter Deposition and Annealing Processes

S. J. Yun¹, J. W. Lim¹, J. S. Noh¹, H. T. Kim¹ (1.ETRI, Korea)

https://doi.org/10.7567/SSDM.2008.P-8-7