[A-3-4] Contribution of Carbon to Activation and Diffusion of Boron in Silicon

H. Itokawa¹, Y. Agatsuma², N. Aoki¹, N. Uchitomi², I. Mizushima¹ (1.Toshiba Corp.(Japan), 2.Nagaoka Univ. of Tech.(Japan))

https://doi.org/10.7567/SSDM.2009.A-3-4