[A-3-4] Contribution of Carbon to Activation and Diffusion of Boron in Silicon

H. Itokawa¹、Y. Agatsuma²、N. Aoki¹、N. Uchitomi²、I. Mizushima¹ (1.Toshiba Corp.(Japan)、2.Nagaoka Univ. of Tech.(Japan))

https://doi.org/10.7567/SSDM.2009.A-3-4