Process Condition Dependence of Random V<sub>T</sub> Variability in NFETs and PFETs

T. Tsunomura; A. Nishida; K. Takeuchi; S. Inaba; S. Kamohara; K. Terada; T. Hiramoto; T. Mogami

doi:https://doi.org/10.7567/SSDM.2009.B-8-1

2009 International Conference on Solid State Devices and Materials

2009年10月6日〜 2009年10月9日
Sendai Kokusai Hotel, Miyagi, Japan

[B-8-1] Process Condition Dependence of Random V_T Variability in NFETs and PFETs

T. Tsunomura¹、A. Nishida¹、K. Takeuchi¹、S. Inaba¹、S. Kamohara¹、K. Terada²、T. Hiramoto^1,3、T. Mogami¹ (1.MIRAI-Selete(Japan)、2.Hiroshima City Univ.(Japan)、3.Univ. of Tokyo(Japan))

https://doi.org/10.7567/SSDM.2009.B-8-1

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2009 International Conference on Solid State Devices and Materials

[B-8-1] Process Condition Dependence of Random VT Variability in NFETs and PFETs

[B-8-1] Process Condition Dependence of Random V_T Variability in NFETs and PFETs