[C-6-2] Sub-30 nm CMOSFET with Ni(Pt)-FUSI/SiON Gate Stack

H. Fukutome¹, K. Okubo¹, S. Akiyama¹, N. Idani¹, H. Ohta¹, K. Kawamura¹, Y. Momiyama¹, S. Satoh¹ (1.Fujitsu Microelectronics Ltd.)

https://doi.org/10.7567/SSDM.2009.C-6-2