[C-7-2] High-Performance three-terminal FinFETs by Combination of Damage-Free Neutral-Beam Etching and Neutral-Beam Oxidation Technologies

K. Sano¹, M. Yonemoto¹, A. Wada¹, K. Endo², T. Matsukawa², M. Masahara², S. Samukawa¹ (1.Tohoku Univ.(Japan), 2.AIST(Japan))

https://doi.org/10.7567/SSDM.2009.C-7-2