[C-7-3] Investigation of Low-Energy Tilted Ion Implantation for FinFET Extension Doping

Y. Liu¹、T. Matsukawa¹、K. Endo¹、S. Ouchi¹、K. Sakamoto¹、J. Tsukada¹、Y. Ishikawa¹、H. Yamauchi¹、M. Masahara¹ (1.AIST)

https://doi.org/10.7567/SSDM.2009.C-7-3