[C-7-3] Investigation of Low-Energy Tilted Ion Implantation for FinFET Extension Doping

Y. Liu¹, T. Matsukawa¹, K. Endo¹, S. Ouchi¹, K. Sakamoto¹, J. Tsukada¹, Y. Ishikawa¹, H. Yamauchi¹, M. Masahara¹ (1.AIST)

https://doi.org/10.7567/SSDM.2009.C-7-3