[E-5-2L] Effect of drain bias stress on the stability of nanocrystalline silicon thin film transistor with various channel length

S. J. Kim¹、S. G. Park¹、S. B. Ji¹、M. K. Han¹ (1.Seoul National Univ.)

https://doi.org/10.7567/SSDM.2009.E-5-2L