[E-7-4] Impact of adequate selection of channel direction on (001) and (110) wafer orientation for strained nanowire transistors

A. Seike¹、H. Takai¹、I. Tsuchida¹、J. Masuda²、D. Kosemura²、A. Ogura²、T. Watanabe¹、I. Ohdomari¹ (1.Waseda Univ.(Japan)、2.Meiji Univ.(Japan))

https://doi.org/10.7567/SSDM.2009.E-7-4