Electric Characterization of Carbon Nanotubes Grown at Low Temperature by Remote Plasma Chemical Vapor Deposition for LSI Interconnects

M. Iizuka; D. Yokoyama; K. Ishimaru; I. Yuitho; T. Takeuchi; S. Sato; M. Nihei; Y. Awano; H. Kawarada

doi:https://doi.org/10.7567/SSDM.2009.E-8-2

[E-8-2] Electric Characterization of Carbon Nanotubes Grown at Low Temperature by Remote Plasma Chemical Vapor Deposition for LSI Interconnects

M. Iizuka¹, D. Yokoyama¹, K. Ishimaru¹, I. Yuitho¹, T. Takeuchi¹, S. Sato², M. Nihei², Y. Awano², H. Kawarada¹ (1.Waseda Univ.(Japan), 2.MIRAI-Selete(Japan))

https://doi.org/10.7567/SSDM.2009.E-8-2

2009 International Conference on Solid State Devices and Materials

[E-8-2] Electric Characterization of Carbon Nanotubes Grown at Low Temperature by Remote Plasma Chemical Vapor Deposition for LSI Interconnects