[K-2-4] Device Design Schemes and Electrical Characterization of Nonvolatile Memory Thin-Film Transistors with the Gate Structure of Al/P(VDF-TrFE)/Al₂O₃/ZnO

S. M. Yoon¹、S. H. Yang¹、S. H. Ko Park¹、S. W. Jung¹、C. W. Byun¹、D. H. Cho¹、S. Y. Kang¹、C. S. Hwang¹、B. G. Yu¹ (1.ETRI)

https://doi.org/10.7567/SSDM.2009.K-2-4