Nanoscale Characterization of HfO<sub>2</sub>/SiO<sub>x</sub> Gate Stack Degradation by Scanning Tunneling Microscopy

2009 International Conference on Solid State Devices and Materials

Oct 6, 2009 - Oct 9, 2009
Sendai Kokusai Hotel, Miyagi, Japan

K. S. Yew¹, Y. C. Ong¹, D. S. Ang¹, K. L. Pey¹, G. Bersuker², P. S. Lysaght², D. Heh² (1.Nanyang Tech. Univ.(Singapore), 2.SEMATECH(USA))