The Japan Society of Applied Physics

[P-1-2] Advanced High-k Materials and Electrical Analysis for Memories: the Role of SiO2-high-k Dielectric Intermixing

L. Morassi1, L. Larcher1, L. Pantisano2, A. Padovani1, R. Degraeve2, M. B. Zahid2, B. J. O'Sullivan2 (1.Univ. di Modena e Reggio Emilia(Italy), 2.IMEC(Belgium))

https://doi.org/10.7567/SSDM.2009.P-1-2