Advanced High-k Materials and Electrical Analysis for Memories: the Role of SiO<sub>2</sub>-high-k Dielectric Intermixing

L. Morassi; L. Larcher; L. Pantisano; A. Padovani; R. Degraeve; M. B. Zahid; B. J. O'Sullivan

doi:https://doi.org/10.7567/SSDM.2009.P-1-2

[P-1-2] Advanced High-k Materials and Electrical Analysis for Memories: the Role of SiO₂-high-k Dielectric Intermixing

L. Morassi¹、L. Larcher¹、L. Pantisano²、A. Padovani¹、R. Degraeve²、M. B. Zahid²、B. J. O'Sullivan² (1.Univ. di Modena e Reggio Emilia(Italy)、2.IMEC(Belgium))

https://doi.org/10.7567/SSDM.2009.P-1-2

2009 International Conference on Solid State Devices and Materials

[P-1-2] Advanced High-k Materials and Electrical Analysis for Memories: the Role of SiO2-high-k Dielectric Intermixing

[P-1-2] Advanced High-k Materials and Electrical Analysis for Memories: the Role of SiO₂-high-k Dielectric Intermixing