[P-2-5] Prediction of UV/VUV Irradiation Damage of Interlayer Dielectrics in Plasma Etching using on-wafer Monitoring Technique
B. Jinnai1、S. Fukuda1、H. Ohtake1、S. Yasuhara2、E. A. Hudson3、S. Samukawa1
(1.Tohoku Univ.(Japan)、2.Japan Advanced Chemicals(Japan)、3.Lam Res. Corp.(USA))
https://doi.org/10.7567/SSDM.2009.P-2-5