Prediction of UV/VUV Irradiation Damage of Interlayer Dielectrics in Plasma Etching using on-wafer Monitoring Technique

B. Jinnai; S. Fukuda; H. Ohtake; S. Yasuhara; E. A. Hudson; S. Samukawa

doi:https://doi.org/10.7567/SSDM.2009.P-2-5

[P-2-5] Prediction of UV/VUV Irradiation Damage of Interlayer Dielectrics in Plasma Etching using on-wafer Monitoring Technique

B. Jinnai¹、S. Fukuda¹、H. Ohtake¹、S. Yasuhara²、E. A. Hudson³、S. Samukawa¹ (1.Tohoku Univ.(Japan)、2.Japan Advanced Chemicals(Japan)、3.Lam Res. Corp.(USA))

https://doi.org/10.7567/SSDM.2009.P-2-5

2009 International Conference on Solid State Devices and Materials

[P-2-5] Prediction of UV/VUV Irradiation Damage of Interlayer Dielectrics in Plasma Etching using on-wafer Monitoring Technique