[P-3-1] Suppression of V_th Variability for n-MOSFET in Dual Oxide Formation Process

Y. Kamata¹, K. Shibusawa¹, K. Abe², S. Sugawa², A. Teramoto², T. Ohmi² (1.OKI Semiconductor Miyagi Co., Ltd.(Japan), 2.Tohoku Univ.(Japan))

https://doi.org/10.7567/SSDM.2009.P-3-1