[P-3-12] Effects of Negative Bias Temperature Stress-induced Degradation and Mismatch on pMOSFETs in 90 nm Technology

C. H. Tu¹、S. Y. Chen¹、A. E. Chuang¹、H. S. Huang¹、Z. W. Jhou²、S. Chou²、J. Ko² (1.National Taipei Univ. of Tech.(Taiwan)、2.UMC(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-3-12