Effects of Negative Bias Temperature Stress-induced Degradation and Mismatch on pMOSFETs in 90 nm Technology

[P-3-12] Effects of Negative Bias Temperature Stress-induced Degradation and Mismatch on pMOSFETs in 90 nm Technology

C. H. Tu¹, S. Y. Chen¹, A. E. Chuang¹, H. S. Huang¹, Z. W. Jhou², S. Chou², J. Ko² (1.National Taipei Univ. of Tech.(Taiwan), 2.UMC(Taiwan))