The Japan Society of Applied Physics

[P-3-15] Carrier Transportation of ALD HfLaO Gate Dielectrics with 0.72 nm EOT

H. W. Chen1、Y. W. Liao1、S. Y. Chen1、C. H. Liu2、H. S. Huang1、L. W. Cheng3、C. T. Lin3、G. H. Ma3 (1.National Taipei Univ. of Tech.(Taiwan)、2.National Taiwan Normal Univ.(Taiwan)、3.UMC(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-3-15