[P-3-15] Carrier Transportation of ALD HfLaO Gate Dielectrics with 0.72 nm EOT

H. W. Chen¹、Y. W. Liao¹、S. Y. Chen¹、C. H. Liu²、H. S. Huang¹、L. W. Cheng³、C. T. Lin³、G. H. Ma³ (1.National Taipei Univ. of Tech.(Taiwan)、2.National Taiwan Normal Univ.(Taiwan)、3.UMC(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-3-15