[P-3-15] Carrier Transportation of ALD HfLaO Gate Dielectrics with 0.72 nm EOT

H. W. Chen¹, Y. W. Liao¹, S. Y. Chen¹, C. H. Liu², H. S. Huang¹, L. W. Cheng³, C. T. Lin³, G. H. Ma³ (1.National Taipei Univ. of Tech.(Taiwan), 2.National Taiwan Normal Univ.(Taiwan), 3.UMC(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-3-15