[P-3-23] Trap Profile and Bias Temperature Instability of ALD-HfSiON Gate Stacks in Advanced MOSFETs

C. K. Chiang¹、Y. H. Chen¹、N. C. Su¹、S. J. Wang¹、C. C. Huang¹、H. Y. Huang¹、C. H. Wu² (1.National Cheng Kung Univ.(Taiwan)、2.Chung Hua Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-3-23