[P-3-7] Ultra thin Ni-silicides with low contact resistance on SOI and strained-SOI
L. Knoll1, Q. T. Zhao1, S. Habicht1, C. Urban1, B. Ghyselen2, S. Mantl1
(1.Forschungszentrum Juelich(Germany), 2.SOITEC(France))
https://doi.org/10.7567/SSDM.2009.P-3-7
