[P-3-7] Ultra thin Ni-silicides with low contact resistance on SOI and strained-SOI

L. Knoll¹、Q. T. Zhao¹、S. Habicht¹、C. Urban¹、B. Ghyselen²、S. Mantl¹ (1.Forschungszentrum Juelich(Germany)、2.SOITEC(France))

https://doi.org/10.7567/SSDM.2009.P-3-7