[P-9-2] Characterization of Polycrystalline Silicon Thin-Film Transistors with Nickel-Titanium Oxide Gate Dielectric Coating by Sol-Gel Method

S. C. Wu¹、R. C. Yen¹、C. K. Deng¹、T. S. Chao¹、S. H. Chuang²、T. F. Lei¹ (1.National Chiao Tung Univ.(Taiwan)、2.National Univ. of Kaohsiung(Taiwan))

https://doi.org/10.7567/SSDM.2009.P-9-2