[L-3-1] Applications of Nanotechnology in Biomedical Micro/Nano Devices

G. J. Wang¹ (1.National Chung Hsing Univ. , Taiwan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[L-3-2] Development of Nanoscale Patterning Method of Self-Assembled Monolayer using Photothermal Desorption in Near-field

Y. Yamamoto¹, Y. Taguchi¹, Y. Nagasaka¹ (1.Keio Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[L-3-3] Positional control of crystal grains in silicon thin film utilizing cage shaped protein

Y. Tojo¹, A. Miura^1,2, I. Yamashita^1,3,4, Y. Uraoka^1,4 (1.NAIST , Japan, 2.National Chiao Tung Univ. , Taiwan, 3.Panasonic Corp., 4.CREST , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[L-3-4] Control of Activation Energy for Electron Transport in Two-Dimensional Array of Si Nanodisks

M. Igarashi¹, C. H. Huang¹, T. Morie², S. Samukawa¹ (1.Tohoku Univ., 2.Kyushu Inst. of Tech. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[L-3-5] Optical Characteristics of Two-dimensional Array of Si Nano-disks Fabricated by Defect-free Neutral Beam Etching with Bio-template

C. H. Huang^1,4, M. Igarashi^1,4, M. F. Budiman¹, R. Oshima^2,4, I. Yamashita^3,4, Y. Okada^2,4, S. Samukawa^1,4 (1.Tohoku Univ., 2.Univ. of Tokyo, 3.NAIST, 4.CREST , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[P-1-1] Strained Si with Smooth and Uniformly Strained Surface Formed by Sputter Epitaxy

H. Hanafusa¹, N. Hirose², A. Kasamatsu², T. Mimura², T. Matsui², H. M. H. Chong³, H. Mizuta³, Y. Suda¹ (1.Tokyo Univ. of Agri. And Tech., 2.National Inst. of Info. and Commun. Tech. , Japan, 3.Univ. of Southampton , UK)

2010 International Conference on Solid State Devices and Materials |PDF Download

[P-1-2] Enhancement of Stress Memorization Technique (SMT) by High Thermal Annealing Temperature

H. Y. Chang¹, J. C. S. Woo¹ (1.University of California, Los Angeles , USA)

2010 International Conference on Solid State Devices and Materials |PDF Download

[P-1-3] Evaluation of Si/SiO₂ Interface Properties for CMOS Fabricated on Hybrid Orientation Substrate with Amorphization/Templated Recrystallization Method

P. C. Huang¹, S. L. Wu², S. J. Chang¹, J. F. Chen¹, Y. T. Huang¹, D. G. Hong², C. Y. Chang¹, C. Y. Wu², C. T. Lin³, M. Ma³, O. Cheng³ (1.National Cheng Kung Univ., 2.Cheng Shiu Univ., 3.UMC , Taiwan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[P-1-4] Efficient Activation of As in Ultrashallow Junction Induced by Thermal Plasma Jet Microsecond Annealing

K. Matsumoto¹, S. Higashi¹, H. Murakami¹, S. Miyazaki¹ (1.Hiroshima Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

[P-1-5] Depth Profile and Retained Dose in SiO₂/Si Structure for B₁₈H_X⁺ Implantation

Y. Kawasaki^1,2, H. Yoshimura¹, K. Asai¹, K. Shibahara² (1.Renesas Electronics Corp., 2.Hiroshima Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF Download

655 results (421 - 430)

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