[PS-6-19] Low Interface Trap Density HfO2/Al2O3/InAs MOS Capacitors Prepared by Nitrogen Plasma Treatment
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
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2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード
2015 International Conference on Solid State Devices and Materials |PDF ダウンロード