The Japan Society of Applied Physics

382件中(341 - 350)

[K-6-01 (Invited)] Si and SiGe Epitaxial Growth in view of Nanosheet CMOS Devices and 3D Sequential Integration

〇Roger Loo1、Andriy Hikavyy1、Clement Porret1、Erik Rosseel1、Gianluca Rengo1,2,3、Rami Khazaka4、Qi Xie4、André Vantomme2、Robert Langer1 (1.imec、2.Quantum Solid State Physics, KU Leuven、3.Fonds Wetenschappelijk Onderzoek (FWO) - Vlaanderen、4.ASM Belgium NV)

2021 International Conference on Solid State Devices and Materials |2021年9月8日(水) 15:45 〜 16:15 |PDF ダウンロード

382件中(341 - 350)