EUV Lithography

[2A508-13] EUV Lithography III

2022年6月29日(水) 13:50 〜 16:00 EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Hiroaki Oizumi(GIGAPHOTON Inc.)

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13:50 〜 14:10

[2A508] Comparison of photoresist sensitivity between KrF, EB and EUV exposure

*Yosuke Ohta¹, Atsushi Sekiguchi¹, Shinji Yamakawa², Tetsuo Harada², Takeo Watanabe², Hiroki Yamamoto³ (1. Litho Tech Japan, 2. University of Hyogo, 3. National Institutes for Quantum Science and Technology)

14:10 〜 14:30

[2A509] Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement

*Tomohito Kizu¹, Shinji Yamakawa², Takeo Watanabe², Seiji Yasui¹, Tomoyuki Shibagaki¹ (1. San-Apro Ltd., 2. Laboratory of Advanced Science and Technology for Industry, University of Hyogo)

14:30 〜 14:50

[2A510] Grazing Incident Resonant Soft X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV resist.

*Atsunori Nakamoto¹, Shinji Yamakawa¹, Tetsuo Harada¹, Takeo Watanabe¹ (1. University of Hyogo)

14:50 〜 15:20

[2A511] Recent Research activity for EUV Lithography at QST [Invited]

*Hiroki YAMAMOTO Yamamoto¹, Yuji Hosaka¹, Kimio Yoshimura¹, Masahiko Ishino¹, Dinh Thanhhung¹, Masaharu Nishikino¹, Yasunari Maekawa¹ (1. National Institutes for Quantum Science and Technology)

15:20 〜 15:50

[2A512] Effect of alternative developer solutions on EUVL patterning [Invited]

*JULIUSJOSEPH SANTILLAN¹, TOSHIRO ITANI¹ (1. Osaka University)

15:50 〜 16:00

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