*Quentin Evrard1, Najmeh Sadegh1, Benjamin Watts3, Nicola Mahne2, Angelo Giglia2, Stefano Nannarone2, Yasin Ekinci3, Michaela Vockenhuber3, Alfred M. Brouwer4
(1. Advanced Research Center for Nanolithography, 2. Consiglio Nazionale delle Ricerche - Istituto Officina dei Materiali, 3. Paul Scherrer Institute, 4. Van't Hoff Institute for Molecular Sciences)