[2B3-508-09] レジスト除去、エッチング、洗浄

[2B3-508] Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma

*Khant Nyar Paing¹, Takeshi AIZAWA¹, Hiroto NISHIOKA², Masashi YAMAMOTO², Tasuku SAKURAI¹, Erdenezaya BAT-ORGIL¹, Yusuke KAYAMORI¹, Yusuke NAKANO¹, Yasunori TANAKA¹, Tatsuo ISHIJIMA¹ (1. Graduate School of Natural Science and Technology, Kanazawa Univ., 2. National Institute of Technology, Kagawa College)