[29p-A3-1~6] 16.2 Processing technologies and devices

[29p-A3-4] Property Distribution of Solution-Processed a-Si:H Films along thickness direction

^○（M1）Yoo Sakuma¹, Keisuke Ohdaira^1,2, Takashi Masuda^1,3, Zhongrong Shen^1,2, Hideyuki Takagishi^1,2, Lam Pham^1,2, Tatsuya Shimoda^1,2,3 (JAIST¹, JST-ALCA², JST-ERATO³)

Keywords:溶液プロセス、液体シリコン、a-Si