セッション情報

EUV Lithography

[2A505-07] EUV Lithography II

2022年6月29日(水) 10:40 〜 12:00 EUV Lithography (A5)

Chairman:Taku Hirayama(HOYA Corp.), Hiroaki Oizumi(GIGAPHOTON Inc.)

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10:40 〜 11:00

[2A505] Nanometrology for evaluating EUV resists for molecular homogeneity and rare sites

*Michael J Eller¹, Jander Cruz¹, Dmitriy S Verkhoturov², Stanislav V. Verkhoturov², Emile A Schweikert² (1. California State University Northridge, 2. Texas A&M University)

11:00 〜 11:30

[2A506] Recent status of the stochastic issues of photoresist materials in EUV lithography [Invited]

*Toru Fujimori¹ (1. FUJIFILM Corporation)

11:30 〜 12:00

[2A507] Synthesis and resist sensitive property of iodine-containing materials using extreme ultraviolet (EUV) exposure tool [Invited]

Hiroto Kudo¹, *Yutaro Iwashige¹, Kazumasa Okamoto², Takahiro Kozawa² (1. Kansai Univ., 2. Osaka Univ.)

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