EUV Lithography

[2A508-13] EUV Lithography III

Wed. Jun 29, 2022 1:50 PM - 4:00 PM EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Hiroaki Oizumi(GIGAPHOTON Inc.)

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1:50 PM - 2:10 PM

[2A508] Comparison of photoresist sensitivity between KrF, EB and EUV exposure

*Yosuke Ohta¹, Atsushi Sekiguchi¹, Shinji Yamakawa², Tetsuo Harada², Takeo Watanabe², Hiroki Yamamoto³ (1. Litho Tech Japan, 2. University of Hyogo, 3. National Institutes for Quantum Science and Technology)

2:10 PM - 2:30 PM

[2A509] Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement

*Tomohito Kizu¹, Shinji Yamakawa², Takeo Watanabe², Seiji Yasui¹, Tomoyuki Shibagaki¹ (1. San-Apro Ltd., 2. Laboratory of Advanced Science and Technology for Industry, University of Hyogo)

2:30 PM - 2:50 PM

[2A510] Grazing Incident Resonant Soft X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV resist.

*Atsunori Nakamoto¹, Shinji Yamakawa¹, Tetsuo Harada¹, Takeo Watanabe¹ (1. University of Hyogo)

2:50 PM - 3:20 PM

[2A511] Recent Research activity for EUV Lithography at QST [Invited]

*Hiroki YAMAMOTO Yamamoto¹, Yuji Hosaka¹, Kimio Yoshimura¹, Masahiko Ishino¹, Dinh Thanhhung¹, Masaharu Nishikino¹, Yasunari Maekawa¹ (1. National Institutes for Quantum Science and Technology)

3:20 PM - 3:50 PM

[2A512] Effect of alternative developer solutions on EUVL patterning [Invited]

*JULIUSJOSEPH SANTILLAN¹, TOSHIRO ITANI¹ (1. Osaka University)

3:50 PM - 4:00 PM

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