EUV Lithography

[2A516-19] EUV Lithography V

Wed. Jun 29, 2022 4:55 PM - 6:45 PM EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Shinji Yamakawa(University of Hyogo)

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4:55 PM - 5:25 PM

[2A516] Process and Sensitivity Optimisation of the Multi-Trigger Resist [Invited]

Carmen Popescu¹, Greg O'Callaghan¹, Alexandra McClelland¹, John Roth², Ed Jackson², *Alex Robinson¹ (1. Irresistible Materials, 2. Nano-C)

5:25 PM - 5:55 PM

[2A517] Chemical mechanisms of metal-based EUV resists [Invited]

*Albert Manfred Brouwer¹ (1. University of Amsterdam)

5:55 PM - 6:25 PM

[2A518] EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing [Invited]

*Cong Que DINH¹, Seiji Nagahara², Yuhei Kuwahara¹, Arnaud Dauendorffer¹, Keisuke Yoshida¹, Makoto Muramatsu¹, Shinichiro Kawakami¹, Satoru Shimura¹, Kosuke Yoshihara¹, John S. Petersen³, Danilo De Simone³, Philippe Foubert³, Geert Vandenberghe³, Lior Hui⁴, Steven Grzeskowiak⁴, Alexandra Krawicz⁴, Nayoung Bae⁴, Kanzo Kato⁴, Kathleen Nafus⁵, Angélique Raley⁵ (1. Tokyo Electron Kyushu, 2. Tokyo Electron Ltd., 3. imec, 4. TEL Technology Ctr., America, 5. Tokyo Electron America, Inc.)

6:25 PM - 6:45 PM

[2A519] Influence of counteranions in the performance of tin-based EUV photoresists.

*Quentin Evrard¹, Najmeh Sadegh¹, Benjamin Watts³, Nicola Mahne², Angelo Giglia², Stefano Nannarone², Yasin Ekinci³, Michaela Vockenhuber³, Alfred M. Brouwer⁴ (1. Advanced Research Center for Nanolithography, 2. Consiglio Nazionale delle Ricerche - Istituto Officina dei Materiali, 3. Paul Scherrer Institute, 4. Van't Hoff Institute for Molecular Sciences)