11:40 〜 12:00
*Yoshiaki Yamada1, Robb Fang2, Alexander Zhu2 (1. Nippon Cobetter Co., Ltd., 2. Hangzhou Cobetter filtration equipment Co., Ltd)
193nm Lithography Extension and EUV HVM Readiness
2022年6月29日(水) 11:40 〜 12:00 193 nm Lithography Extension and EUV HVM Readiness (A7)
Chairman:Yoshio Kawai(Shin-Etsu Chemical), Tsukasa Azuma
11:40 〜 12:00
*Yoshiaki Yamada1, Robb Fang2, Alexander Zhu2 (1. Nippon Cobetter Co., Ltd., 2. Hangzhou Cobetter filtration equipment Co., Ltd)