The 39th International Conference of Photopolymer Science and Technology

講演情報

印刷

Next Generation Lithography, EB Lithography and Nanotechnology

[2A101-01] Next Generation Lithography, EB Lithography and Nanotechnology

2022年6月29日(水) 11:10 〜 11:30 Next Generation Lithography, EB Lithography and Nanotechnology (A1)

Chairman:Yoshio Kawai(Shin-Etsu Chemical), Tsukasa Azuma

11:10 〜 11:30

[2A101] Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight

*Akihiro Konda1, Hiroki Yamamoto2, Takahiro Kozawa1, Shusuke Yoshitake3 (1. Osaka University, 2. National Institutes for Quantum Science and Technology, 3. NuFlare Technology Inc.)