The 39th International Conference of Photopolymer Science and Technology

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EUV Lithography

[2A508-13] EUV Lithography III

Wed. Jun 29, 2022 1:50 PM - 4:00 PM EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Hiroaki Oizumi(GIGAPHOTON Inc.)

1:50 PM - 2:10 PM

[2A508] Comparison of photoresist sensitivity between KrF, EB and EUV exposure

*Yosuke Ohta1, Atsushi Sekiguchi1, Shinji Yamakawa2, Tetsuo Harada2, Takeo Watanabe2, Hiroki Yamamoto3 (1. Litho Tech Japan, 2. University of Hyogo, 3. National Institutes for Quantum Science and Technology)