The 39th International Conference of Photopolymer Science and Technology

講演情報

印刷

EUV Lithography

[2A508-13] EUV Lithography III

2022年6月29日(水) 13:50 〜 16:00 EUV Lithography (A5)

Chairman:Hiroto Kudoh(Kansai University), Hiroaki Oizumi(GIGAPHOTON Inc.)

13:50 〜 14:10

[2A508] Comparison of photoresist sensitivity between KrF, EB and EUV exposure

*Yosuke Ohta1, Atsushi Sekiguchi1, Shinji Yamakawa2, Tetsuo Harada2, Takeo Watanabe2, Hiroki Yamamoto3 (1. Litho Tech Japan, 2. University of Hyogo, 3. National Institutes for Quantum Science and Technology)