[2A516-19] EUV Lithography V

[2A519] Influence of counteranions in the performance of tin-based EUV photoresists.

*Quentin Evrard¹, Najmeh Sadegh¹, Benjamin Watts³, Nicola Mahne², Angelo Giglia², Stefano Nannarone², Yasin Ekinci³, Michaela Vockenhuber³, Alfred M. Brouwer⁴ (1. Advanced Research Center for Nanolithography, 2. Consiglio Nazionale delle Ricerche - Istituto Officina dei Materiali, 3. Paul Scherrer Institute, 4. Van't Hoff Institute for Molecular Sciences)