The 39th International Conference of Photopolymer Science and Technology

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193nm Lithography Extension and EUV HVM Readiness

[2A701-01] 193nm Lithography Extension and EUV HVM Readiness

Wed. Jun 29, 2022 11:40 AM - 12:00 PM 193 nm Lithography Extension and EUV HVM Readiness (A7)

Chairman:Yoshio Kawai(Shin-Etsu Chemical), Tsukasa Azuma

11:40 AM - 12:00 PM

[2A701] Metal purifiers specific to lithography materials

*Yoshiaki Yamada1, Robb Fang2, Alexander Zhu2 (1. Nippon Cobetter Co., Ltd., 2. Hangzhou Cobetter filtration equipment Co., Ltd)