The 39th International Conference of Photopolymer Science and Technology

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General Scopes of Photopolymer Science and Technology

[2B3-508-09] レジスト除去、エッチング、洗浄

Wed. Jun 29, 2022 3:50 PM - 4:50 PM レジスト除去、エッチング、洗浄 (B3-5)

座長:部家 彰(兵庫県立大学)、堀邊 英夫(大阪公立大学)

3:50 PM - 4:10 PM

[2B3-508] Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma

*Khant Nyar Paing1, Takeshi AIZAWA1, Hiroto NISHIOKA2, Masashi YAMAMOTO2, Tasuku SAKURAI1, Erdenezaya BAT-ORGIL1, Yusuke KAYAMORI1, Yusuke NAKANO1, Yasunori TANAKA1, Tatsuo ISHIJIMA1 (1. Graduate School of Natural Science and Technology, Kanazawa Univ., 2. National Institute of Technology, Kagawa College)