The 39th International Conference of Photopolymer Science and Technology

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Computational / Analytical Approach for Lithography Processes

[A4] Computational / Analytical Approach for Lithography processes

Thu. Jun 30, 2022 9:00 AM - 11:30 AM Computational / Analytical Approach for Lithography Processes (A4)

Chairman:Tomoki Nagai(JSR Corporation), Takahiro Kozawa(Osaka University)

9:00 AM - 9:30 AM

[3A401] Stochastic Defect Formation Analysis in an EUV Photoresist Using Computational Methods [invited]

*Lawrence S Melvin1, Yudhishthir Kankel1, Zachary A Levinson1, Ulrich Welling1, Hironobu Taoka1, Hans-jurgen Stock1, Wolfgang Demmerle1 (1. Synopsys)