[A4] Computational / Analytical Approach for Lithography processes

[3A401] Stochastic Defect Formation Analysis in an EUV Photoresist Using Computational Methods [invited]

*Lawrence S Melvin¹, Yudhishthir Kankel¹, Zachary A Levinson¹, Ulrich Welling¹, Hironobu Taoka¹, Hans-jurgen Stock¹, Wolfgang Demmerle¹ (1. Synopsys)