Stochastic simulation of pattern formation in EUV resists with photo-decomposable quenchers [invited]

Presentation information

Computational / Analytical Approach for Lithography Processes

Thu. Jun 30, 2022 9:00 AM - 11:30 AM Computational / Analytical Approach for Lithography Processes (A4)

Chairman:Tomoki Nagai(JSR Corporation), Takahiro Kozawa(Osaka University)

10:30 AM - 11:00 AM

Kyohei Imai¹, Bunta Inoue¹, Yoshihiko Hirai¹, *Masaaki Yasuda¹ (1. Osaka Metropolitan University)